Wafer-level services

Multi-Project Fan-Out Wafer Level Packaging

This service is accessible for all EUROPRACTICE customers. It is provided by our partner Fraunhofer.

Design Rules & MaterialsMulti-project wafer processing is an established approach in semiconductor manufacturing for fast and low-cost prototyping. This idea is now transferred to fan-out wafer level packaging. Here dies from different sources or different technologies with varying thickness and size can be handled and packaged with one integration technology. This offers a path to a well adopted technology, especially for RF applications.
MPFOWL Package SpecificationDie delivery: WafflePack, wafer, wheel
Die size: 1.5 – 7 mm edge length
Die thickness: 200 – 300 μm
Package thickness: 450 μm
Package size: 10×10 mm², smaller package size possible with extra effort
Metal layers: 2
Integration of e.g. antennas and passive structures in RDL
Pin-out: BGA
- Pitch: 500 μm
- Ball size: 300 μm
- Solder: SnAgCu
Defined packaging materials

You can find more details in the MPFOWLP flyer




Dr. Tanja Braun

e-mail: europractice@izm.fraunhofer.de

Fraunhofer Institute for Reliability and Microintegration IZM

Gustav-Meyer-Allee 25

13355 Berlin, Germany


OPEN 3D post-process for 3D integration

CMP, in partnership with CEA-LETI, offers a set of post-processes allowing various types of 3D assemblies.

These wafer-level services are available only for the customers of the EUROPRACTICE partner CMP.


Those post-processes are operated at wafer-level and are carried out after standard MPW runs on a selected subset of technologies. The goal is to integrate 3D interconnections to chips processed through CMP, in order to enable flip-chip on organic or ceramic substrates as well as Die-to-Die or Die-to-Interposer assemblies.


Two types of post-processes are available, including different options:

  • Front-side: 3D interconnections (µ-Bumps or UBM).
  • Back-side: Wafer thinning, TSV (via-last) and RDL, 3D interconnections (Bumps).


Technology characteristics:

µBumps (Cu-pillar)Cu/SnAg ; ø25 µm ; 50 µm min pitch ; ~20 µm thickness
UBMTiNiAu ; 25 µm min width; 50 µm min pitch ; 1 µm thickness
TSV-LASTØ60 µm x 120 µm depth ; 120 µm min pitch
Backside RDLCu ; 20 µm min width ; 40 µm min pitch ; 4-8 µm Thickness

Accessibility conditions:

  • As a MPW OPEN3D Front‐side post process (μ‐Bumps or UBM)
  • As a MPW OPEN3D Back‐side post process (TSV, RDL and Bumps)
  • As a MPW OPEN3D Back‐side + Front‐side post process (μ‐Bumps or UBM + TSV, RDL and Bumps)

MPW OPEN 3D post processes are available for projects and wafers processed through CMP on the last CMP MPW run of the year for the following technologies:

CEA-LETISilicon Photonics
STMicroelectronicsCMOS28FDSOI (frontside only), BiCMOS055, CMOS065, BiCMOS9MW

Those runs are subject to a certain minimum number of participants sharing the MPW.

MPW OPEN 3D post‐processes must be anticipated at an early stage as they require an additional NDA, the distribution of a specific DRM and an add‐on to the Design‐Kit. Additionaly, this must be indicated it in the reservation form.

  • As a dedicated OPEN3D post‐process

Dedicated OPEN3D post processes can be made available on any CMP MPW Run at any time of the year after a feasibility study. In this case, restrictions to specific geometrical parameters of the design structure are not imposed and can be chosen within a process window. Please contact CMP for more information/quotation.


Application area:
3D/2.5D integration


Design kit version:

CMP/LETI 3D add-on is required to design post-processed modules


Verification tools:

DRC calibre die-level; DRC calibre 3Dstack for assembly-level checks (at CMP only)


3D modules Library


OPEN 3D post processing is available upon request, please contact ajith-sivadasan.moreau@mycmp.fr  for more information on packaging solutions.

ams 0.35µm Wafer-level bumping

Fraunhofer and CMP provide access to this ams technology.

Technology characteristicsSolder bumping consists in manufacturing metal spheres acting as interconnections for flip-chip. Those spheres are composed of a Sn/Ag/Cu alloy (SAC). Before the sphere can be deposited, the deposition of an Under Bump Metalization (UBM) layer is required.
This option, available on ams 0.35 & 0.18 runs only, is operated at wafer-level within ams cleanroom after CMOS process. It allows the deposition of an array of solder balls at wafer-level, with an I/O pitch compatible with traditional printed circuit board (PCB) assembly processes. For mechanical reasons solder balls are usually evenly distributed over the whole chip surface and electrically connected to the IC‘s CMOS pads by means of a redistribution layer (RDL) included in the option.
Application areaSingle die flip-chip packaging
Design Kit versionOption supported by ams hitkit 4.10 ISR15, through an add-on

STMicroelectronics Wafer-level bumping

This technology is provided by CMP. Copper pillars are manufactured at wafer-level by STMicroelectronics. This interconnection is composed of an Under Bump Mettalization (UBM), upon which a pillar of copper is grown, a capping of Sn/Ag allows the die to be assembled on a substrate by reflow process. The dimensions of this copper pillar are approximately 62 µm in diameter for 65 µm in height, thus allowing a fine pitch (down to 90 µm).


Accessibility conditions:

  • Copper pillar option is available on CMOS28FDSOI, BiCMOS055, CMOS065 MPW and dedicated runs as options.
  • FC44S pad class must be used in the design to be compatible with this option.


More detailed techical information is available on the CMP website.