In the last years, the proprietary TriPleX™ waveguide technology of LioniX International has matured and has become one of the three main integrated optical platforms (next to InP and SOI). TriPleX™ structures are realized with CMOS compatible fabrication equipment and the materials used are based on chemical endproducts of LPCVD processes, resulting in very reproducible material properties, allowing design by geometry.


The basic concept of a TriPleX™ waveguide consists of a multilayer stack of stochiometric silicon nitride and silicon oxide. These materials have an opposite stress when deposited on a silicon wafer, in which nitride is tensile and oxide is compressive, and stacking them in a multilayer results in a macroscopically low stress layer stack.